As a long-standing equipment supplier, Vistec Electron Beam GmbH is
providing leading technology solutions for advanced electron-beam
lithography. Based on the Variable Shaped Beam (VSB) principle, the
electron-beam lithography systems are mainly utilized for semiconductor
applications and advanced research as silicon direct write, compound
semiconductor, mask making as well as integrated optics and several new emerging markets. Among standardized and proven systems, Vistec Electron Beam also provides customized solutions according to special Technology requirements.
The company's roots go back to Carl Zeiss Jena when the first Commercial Variable Shaped Beam system was introduced in the 1970s.
The company is located in Jena, Germany. In addition to its production
facility in Germany, Vistec Electron Beam maintains service and support
centers in Europe, Taiwan and in the US.