HANNOVER MESSE 2018,
23 - 27 April
AGC Glass Europe
AGC Plasma Technology Solutions has successfully made the upscaling of a linearized Hollow Cathode for Plasma Enhanced Chemical Vapor Deposition (PE CVD) till a width of 3.6 meters. This allows the industrialization of this technology for large area coating on a wide variety of substrates. The integration of the hollow cathode in a standard magnetron sputtering line allows high rate deposition of SiO2 layers among other materials.
Plasma coating equipment design and manufacturing
AGC Plasma Technology Solutions in partnership with Ionics surface technologies presents their first Ionlab 400 instrument on the Hannover Messe 2018. This equipment ...