Microstructures with high aspect ratios are used, among other things, in X-ray lenses, in fluidic filter structures, for optical applications in medical technology, and in quality assurance. In the production of extremely high microstructures of very small diameters, it is material stability which limits the maximum attainable heights of structures. In X-ray lithographic production, a photosensitive polymer is applied to a substrate made of silicon and then cured in spots by targeted exposure to light. As polymer and silicon expand differently under temperature changes, different temperatures in a process can cause deformation of the entire component where geometries are critical. Scientists of the Institute of Microstructure Technology have developed a technique of producing microstructures out of a material without a substrate. For this purpose, opposite edges of a square block of the material to be structured are exposed to light so that the first step gives rise to a bottom and a lid. In the second step, the microstructures between the bottom and the lid plates are exposed to light. Using only one material avoids deformation in the production process. The bottom and lid plates provide enough stability to the structures arranged in the space in between to prevent damage to structures. The transition between exposed and unexposed areas is very sharp.