HANNOVER MESSE 2020,
20. - 24. April
PECVD is achieved by introducing reactive gases between parallel electrodes creating the plasma. This low temperature process can be used to deposit silicon oxide ...
Magnetron sputtering is a well established PVD technology allowing for large area coating. AGC has abundant experience with this technology for the coating of low ...
Ion implantation equipment consists of an ion source, where ions of the desired element are produced and accelerated and are subsequently bombarding the substrate. ...
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