HANNOVER MESSE 2019,
01 - 05 April
PECVD is achieved by introducing reactive gases between parallel electrodes creating the plasma. This low temperature process can be used to deposit silicon oxide ...
Magnetron sputtering is a well established PVD technology allowing for large area coating. AGC has abundant experience with this technology for the coating of low ...
Ion implantation equipment consists of an ion source, where ions of the desired element are produced and accelerated and are subsequently bombarding the substrate. ...
AGC Plasma Technology Solutions brings the coating technologies used within the glass industry available to a broad range of industries. Our fields of expertise include magnetron sputtering, plasma enhanced chemical vapor deposition and ion beam implantation.
AGC Plasma is an industrial partner to upscale innovative plasma coating processes and we have the capabilities to support our customers till reaching operational excellence in their production.
AGC Plasma has a customer centric approach with a demonstration center in Lauenförde, Germany at the service of our customers to make product prototypes and realize proof of concepts.
Next, AGC Plasma is a one-stop provider for the vacuum plasma equipment. We take full responsibility for the project management and start-up of a turnkey vacuum plasma process line.
Rue Louis Blériot 12
Phone: +32 4 73552414