HANNOVER MESSE 2019,
01 - 05 April
AGC Plasma Technology Solutions
Ion implantation equipment consists of an ion source, where ions of the desired element are produced and accelerated and are subsequently bombarding the substrate. This surface treatment to incorporate foreign elements into a surface are used in the semiconductor industry but also in the metallurgical industry to increase the hardness and corrosion resistance. We have developed the ion implantation equipment dedicated for the surface treatment (glass, sapphire, metals, polymers) and have been granted over 30 patents in this field
Plasma Enhanced CVD
PECVD is achieved by introducing reactive gases between parallel electrodes creating the plasma. This low temperature process can be used to deposit silicon oxide ...
Magnetron sputtering is a well established PVD technology allowing for large area coating. AGC has abundant experience with this technology for the coating of low ...